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Home > english-chinese > "deposition pressure" in Chinese

Chinese translation for "deposition pressure"

沉积张力

Related Translations:
deposition bulb:  沉积瓶
fund deposition:  存款
refractory deposition:  耐火层
photochemical deposition:  光化学淀积
copper deposition:  铜的沉积
alternate deposition:  交互堆积法(焊接)交互熔敷法
erratic deposition:  不规则沉积
semen deposition:  输精,授精,精液的注入
coastal deposition:  海岸沉积
calcium deposition:  钙沉积
Example Sentences:
1.The effects of various parameters on growth of the films were studied . it was observed that the size of particles in the films is decreased with the deposition pressure
在本工作中,着重研究了主要工艺参数对纳米- sic薄膜生长特性的影响。
2.Main research results are summarized as follows : 1 . based on the study of deposition parameters , the optimized deposition parameters were : 9pa for the deposition pressure , 100w for the deposition power , and 600oc
主要结果如下: 1 .对磁控溅射法制备bst薄膜的工艺参数进行了较系统地研究,对制备参数进行了优化。
3.Effects of methane concentration , deposition pressure , gas flow rate and substrate temperature on diamond coating on quartz glass by mpcvd were studied systemically . the best parameters were established by experiments
系统地讨论了在石英玻璃上mpcvd沉积金刚石薄膜的实验过程中,甲烷浓度、沉积气压、气体流量、基体温度等不同实验工艺参数对金刚石薄膜质量的影响。
4.From the optimization experiment , it was concluded that , the best parameters of sputtering ito films were deposition pressure of 1mtorr , o2 flow of 0sccm , vapor partial pressure of 2 10 - 5torr , dc power of 200w , substrate temperature of 100
/ ,可见光区平均透过率为83 . 6 % ,平均粗糙度为1 . 794nm 。本论文首次使用薄膜的光电性能指数来确定制备ito膜的工艺参数,比较全面地分析了ito膜的各方面性能和各工艺参数对ito膜性能的影响。
5.The shimadzu uv - 3101 spectrophotometer was employed to get the uv - visible transmission and reflection spectra . both of the absorption coefficient ( a ) and optical band gap ( eg ) were calculated from the transmission and reflection spectra of the films . it was observed that eg decreased with an increase in the deposition pressure
采用紫外-可见光分光光度计测定了纳米- sic薄膜透射光谱和反射光谱,并通过样品的透射光谱和反射光谱计算了纳米- sic薄膜吸收吸收系数和光学带隙eto实验结果表明,增大工作气压导致纳米- sic薄膜的光学带隙的减小。
6.Using the microwave selective heating property for materials , by setup equivalent equation , and first time inducing the electromagnetic field perturbation theory to the design of heating materials for substrate in mpcvd , three temperature distribution modes were established , including temperature distribution comprehensive mode of inhomogeneous plasma , temperature distribution composite mode of composite substrate materials , temperature distribution perturbation mode of composite materials , which ii provided an whole new technology route to the design of substrate heating system in mpcvd and guided the preparation of heating materials for substrate . and then the heating materials for substrate were designed and optimized to obtain large area homogeneous temperature distribution even larger than substrate holder ' s diameter . as an important part , this thesis researched the nucleation and growth of diamond films in mpcvd , systematically researched the effects of substrate pretreatment , methane concentration , deposition pressure and substrate temperature etc experimental technologic parameters on diamond films " quality on ( 100 ) single crystal silicon substrate in the process of mpcvd , characterized the films qualities in laser raman spectra ( raman ) , x - ray diffraction ( xrd ) , scanning electron microscopy ( sem ) , infrared transmission spectra ( ir ) , atomic force microscopy ( afm ) , determined the optimum parameters for mpcvd high quality diamond in the mpcvd - 4 mode system
该系统可通过沉积参数的精确控制,以控制沉积过程,减少金刚石膜生长过程中的缺陷,并采用光纤光谱仪检测分析等离子体的可见光光谱以监测微波等离体化学气相沉积过程;利用微波对材料的选择加热特性,通过构造等效方程,并首次将电磁场摄动理论引入到mpcvd的基片加热材料的设计中,建立了非均匀等离子体温度场综合模型、复合介质基片材料的复合温度场模型及复合介质材料温度场摄动模型,为mpcvd的基片加热系统设计提供了一条全新的技术路线以指导基片加热材料的制备,并对基片加热材料进行了设计和优选,以获取大面积均匀的温度场区,甚至获得大于基片台尺寸的均匀温度区;作为研究重点之一,开展了微波等离体化学气相沉积金刚石的成核与生长研究,系统地研究了在( 100 )单晶硅基片上mpcvd沉积金刚石膜的实验过程中,基片预处理、甲烷浓度、沉积气压、基体温度等不同实验工艺参数对金刚石薄膜质量的影响,分别用raman光谱、 x射线衍射( xrd ) 、扫描电镜( sem ) 、红外透射光谱( ir ) 、原子力显微镜( afm )对薄膜进行了表征,确立了该系统上mpcvd金刚石膜的最佳的实验工艺参数。
7.The paper systemically studied effects of methane concentration , deposition pressure , gas flow rate and substrate temperature on diamond coating on wc - co tools by mpcvd . the best parameters were established by experiments . influence of diamond film and coating adhesion was compared with two different pretreatments
本文系统地研究了在硬质合金上mpcvd沉积金刚石薄膜的实验过程中,甲烷浓度、沉积气压、气体流量、基体温度等不同实验工艺参数对金刚石薄膜质量的影响。
Similar Words:
"deposition on teeth" Chinese translation, "deposition pattern" Chinese translation, "deposition physical vapor" Chinese translation, "deposition pit" Chinese translation, "deposition potential" Chinese translation, "deposition process" Chinese translation, "deposition rate" Chinese translation, "deposition rate factor" Chinese translation, "deposition reaction" Chinese translation, "deposition sequence" Chinese translation